Skip to main content
U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

Fabrication of 200 nm Period Hard X-Ray Phase Gratings



Houxun Miao, Andrew A. Gomella, Nicholas Chedid, Lei Chen, Han Wen


Far field x-ray grating interferometry achieves extraordinary phase sensitivity in imaging weakly absorbing samples, provided that the grating period is within the transverse coherence length of the x-ray source. Here we describe a cost-efficient process to fabricate large area, 100 nm half-pitch hard x-ray phase gratings with an aspect ratio of 32. The nanometric gratings are suitable for ordinary compact x-ray sources having low spatial coherence, as demonstrated by x-ray diffraction experiments.
Nano Letters


Hard x-ray phase grating, grating Bonse-Hart interferometer, x-ray Mach-Zehnder interferometer, x-ray phase contrast imaging, nano-imprint lithography, cryogenic reactive ion etch, atomic layer deposition, electroplating.


Miao, H. , Gomella, A. , Chedid, N. , Chen, L. and Wen, H. (2014), Fabrication of 200 nm Period Hard X-Ray Phase Gratings, Nano Letters, [online],, (Accessed April 20, 2024)
Created June 10, 2014, Updated October 12, 2021