NOTICE: Due to a lapse in annual appropriations, most of this website is not being updated. Learn more.

Form submissions will still be accepted but will not receive responses at this time. Sections of this site for programs using non-appropriated funds (such as NVLAP) or those that are excepted from the shutdown (such as CHIPS and NVD) will continue to be updated.

U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

PUBLICATIONS

Extracting Dimensional Parameters of Gratings Produced with Self-Aligned Multiple Patterning Using GISAXS

Published

Author(s)

Mika Pfluger, Regis J. Kline, Analia Fernandez Herrero, Martin Hammerschmidt, Victor Soltwisch, Michael Krumrey
Citation
Journal of Micro/Nanolithography, MEMS, and MOEMS
Volume
19
Issue
1
Pub Type
Journals

Download Paper

https://doi.org/10.1117/1.JMM.19.1.014001
Local Download
Nanometrology and Nanoelectronics

Citation

Pfluger, M. , Kline, R. , Fernandez Herrero, A. , Hammerschmidt, M. , Soltwisch, V. and Krumrey, M. (2020), Extracting Dimensional Parameters of Gratings Produced with Self-Aligned Multiple Patterning Using GISAXS, Journal of Micro/Nanolithography, MEMS, and MOEMS, [online], https://doi.org/10.1117/1.JMM.19.1.014001, https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=929069 (Accessed October 1, 2025)

Issues

If you have any questions about this publication or are having problems accessing it, please contact [email protected].

Created January 27, 2020, Updated October 12, 2021
Was this page helpful?