Skip to main content
U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

Emittance Standards for Improved Radiation Thermometry During Thermal Processing of Silicon Materials

Published

Author(s)

Benjamin K. Tsai, D P. DeWitt, E A. Early, Leonard M. Hanssen, Sergey Mekhontsev, Matthias Rink, Kenneth G. Kreider, B J. Lee, Zhuomin Zhang
Proceedings Title
Proceedings 9th International Symposium on Temperature and Thermal Measurements in Industry and Science
Conference Dates
June 22-25, 2004
Conference Location
Dubrovnik, CR
Conference Title
International Symposium on Temperature and Thermal Measurements in Industry and Science

Keywords

emittance standards, models, optical properties, radiation thermometry, semiconductor thermal processing, uncertainty

Citation

Tsai, B. , DeWitt, D. , Early, E. , Hanssen, L. , Mekhontsev, S. , Rink, M. , Kreider, K. , Lee, B. and Zhang, Z. (2004), Emittance Standards for Improved Radiation Thermometry During Thermal Processing of Silicon Materials, Proceedings 9th International Symposium on Temperature and Thermal Measurements in Industry and Science, Dubrovnik, CR, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=841831 (Accessed August 9, 2022)
Created June 22, 2004, Updated February 17, 2017