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Embracing Uncertainty: Modeling Uncertainty in EPMA - Part II

Published

Author(s)

Nicholas Ritchie

Abstract

This, the second in a series of articles present a new framework for considering the computation of uncertainty in electron excited X-ray microanalysis measurements, will discuss matrix correction. The framework presented in the first article will be applied to the matrix correction model called ''Pouchou and Pichoir's Simplified Model'' or simply ''XPP''. This uncertainty calculation will consider the influence of beam energy, take-off angle, mass- absorption coefficient, surface roughness and other parameters. Since uncertainty calculations and measurement optimization are so intimately related, it also provides a starting point for optimizing accuracy through choice of measurement design.
Citation
Microscopy and Microanalysis

Keywords

matrix correction, uncertainty, microanalysis, electron probe microanalysis, energy dispersive x-ray spectrometry, wavelength dispersive x-ray spectrometry

Citation

Ritchie, N. (2001), Embracing Uncertainty: Modeling Uncertainty in EPMA - Part II, Microscopy and Microanalysis, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=930079 (Accessed June 18, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created January 1, 2001, Updated August 26, 2022