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Electron Scattering and Dissociative Attachment by SF6 and Its Electrical-Discharge By-Products

Published

Author(s)

H. X. Wan, J. H. Moore, James K. Olthoff, Richard J. Van Brunt
Citation
Plasma Chemistry and Plasma Processing
Issue
1

Citation

Wan, H. , Moore, J. , Olthoff, J. and Van Brunt, R. (1993), Electron Scattering and Dissociative Attachment by SF6 and Its Electrical-Discharge By-Products, Plasma Chemistry and Plasma Processing, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=14452 (Accessed April 21, 2024)
Created February 28, 1993, Updated October 12, 2021