Wan, H.
, Moore, J.
, Olthoff, J.
and Van Brunt, R.
(1993),
Electron Scattering and Dissociative Attachment by SF6 and Its Electrical-Discharge By-Products, Plasma Chemistry and Plasma Processing, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=14452
(Accessed January 26, 2025)
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Electron Scattering and Dissociative Attachment by SF6 and Its Electrical-Discharge By-Products
Published
Author(s)
H. X. Wan, J. H. Moore, ,
Citation
Plasma Chemistry and Plasma Processing
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1
Pub Type
Journals
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Created February 28, 1993, Updated October 12, 2021