TY  - JOUR
AU  - H. Wan
AU  - J. Moore
AU  - James Olthoff
AU  - Richard Van Brunt
C2  - Plasma Chemistry and Plasma Processing
DA  - 1993-03-01 00:03:00
LA  - en
PB  - Plasma Chemistry and Plasma Processing
PY  - 1993
TI  - Electron Scattering and Dissociative Attachment by SF6 and Its Electrical-Discharge By-Products
UR  - https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=14452
ER  -