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PUBLICATIONS

Effects of Lightpipe Proximity on Si Wafer Temperature in Rapid Thermal Processing Tools

Published

Author(s)

K G. Kreider, D H. Chen, W A. Kimes, D P. DeWitt, Benjamin K. Tsai
Proceedings Title
2003 Int''l Conf. Characterization and Metrology for ULSI Technology
Conference Dates
March 24-28, 2003
Conference Location
Austin, TX, USA
Conference Title
Proc. 2003 Int'l Conf. Characterization and Metrology for ULSI Technology
Pub Type
Conferences

Citation

Kreider, K. , Chen, D. , Kimes, W. , DeWitt, D. and Tsai, B. (2003), Effects of Lightpipe Proximity on Si Wafer Temperature in Rapid Thermal Processing Tools, 2003 Int''l Conf. Characterization and Metrology for ULSI Technology , Austin, TX, USA (Accessed December 12, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created December 31, 2002, Updated October 12, 2021