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PUBLICATIONS

Effect of Intermediate Thermal Processing on Microstructural Changes of Oxygen Implanted Silicon-on-Insulator Material

Published

Author(s)

J. H. Lee, J Park, S. J. Krause, Peter Roitman, M. K. El-Ghor
Proceedings Title
Proc., 1991 Materials Research Society Symposium
Volume
235
Conference Dates
December 2-6, 1991
Conference Location
Boston, MA, USA
Pub Type
Conferences

Citation

Lee, J. , Park, J. , Krause, S. , Roitman, P. and El-Ghor, M. (1992), Effect of Intermediate Thermal Processing on Microstructural Changes of Oxygen Implanted Silicon-on-Insulator Material, Proc., 1991 Materials Research Society Symposium, Boston, MA, USA (Accessed March 13, 2025)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created December 30, 1992, Updated October 12, 2021