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Effect of Intermediate Thermal Processing on Microstructural Changes of Oxygen Implanted Silicon-on-Insulator Material

Published

Author(s)

J. H. Lee, J Park, S. J. Krause, Peter Roitman, M. K. El-Ghor
Proceedings Title
Proc., 1991 Materials Research Society Symposium
Volume
235
Conference Dates
December 2-6, 1991
Conference Location
Boston, MA, USA

Citation

Lee, J. , Park, J. , Krause, S. , Roitman, P. and El-Ghor, M. (1992), Effect of Intermediate Thermal Processing on Microstructural Changes of Oxygen Implanted Silicon-on-Insulator Material, Proc., 1991 Materials Research Society Symposium, Boston, MA, USA (Accessed March 3, 2024)
Created December 30, 1992, Updated October 12, 2021