Lee, J.
, Park, J.
, Krause, S.
, Venables, D.
and Roitman, P.
(1994),
Effect of Implantation Conditions on Defect Microstructure in Annealed SIMOX, Proc., Electrochemical Society International Symposium on SOI Technology and Devices, San Francisco, CA, USA
(Accessed April 18, 2024)
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Effect of Implantation Conditions on Defect Microstructure in Annealed SIMOX
Published
Author(s)
J. H. Lee, J Park, S. J. Krause, D. Venables,
Proceedings Title
Proc., Electrochemical Society International Symposium on SOI Technology and Devices
Conference Dates
May 22-27, 1994
Conference Location
San Francisco, CA, USA
Pub Type
Conferences
Citation
Created December 30, 1994, Updated October 12, 2021