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Effect of Implantation Conditions on Defect Microstructure in Annealed SIMOX

Published

Author(s)

J. H. Lee, J Park, S. J. Krause, D. Venables, Peter Roitman
Proceedings Title
Proc., Electrochemical Society International Symposium on SOI Technology and Devices
Conference Dates
May 22-27, 1994
Conference Location
San Francisco, CA, USA

Citation

Lee, J. , Park, J. , Krause, S. , Venables, D. and Roitman, P. (1994), Effect of Implantation Conditions on Defect Microstructure in Annealed SIMOX, Proc., Electrochemical Society International Symposium on SOI Technology and Devices, San Francisco, CA, USA (Accessed April 24, 2024)
Created December 30, 1994, Updated October 12, 2021