Roitman, P.
, Simons, D.
, Visitserngtrakul, S.
, Jung, C.
and Krause, S.
(1990),
Effect of Annealing Ambient on the Precipitation Processes in Oxygen-Implanted Silicon-on-Insulator Material, Extended Abstract, Proc., 12th International Congress for Electron Microscopy, Seattle, WA, USA
(Accessed April 23, 2024)
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Effect of Annealing Ambient on the Precipitation Processes in Oxygen-Implanted Silicon-on-Insulator Material, Extended Abstract
Published
Author(s)
, , S. Visitserngtrakul, C. O. Jung, S. J. Krause
Proceedings Title
Proc., 12th International Congress for Electron Microscopy
Conference Dates
August 12-17, 1990
Conference Location
Seattle, WA, USA
Pub Type
Conferences
Citation
Created December 30, 1990, Updated October 12, 2021