TY  - CONF
AU  - Peter Roitman
AU  - David Simons
AU  - S. Visitserngtrakul
AU  - C. Jung
AU  - S. Krause
C2  - Proc.,  12th International Congress for Electron Microscopy, Seattle, WA, USA
DA  - 1990-12-31 00:12:00
LA  - en
PB  - Proc.,  12th International Congress for Electron Microscopy, Seattle, WA, USA
PY  - 1990
TI  - Effect of Annealing Ambient on the Precipitation Processes in Oxygen-Implanted Silicon-on-Insulator Material, Extended Abstract
ER  -