Rennex, B.
, Ehrstein, J.
and Scace, R.
(1994),
Development of a Standard Reference Material for Measurement of Interstitial Oxygen Concentration in Semiconductor Silicon by Infrared Absorption, Extended Abstracts of the Electrochemical Society, Miami Beach, FL, USA
(Accessed April 25, 2024)
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Development of a Standard Reference Material for Measurement of Interstitial Oxygen Concentration in Semiconductor Silicon by Infrared Absorption
Published
Author(s)
, ,
Proceedings Title
Extended Abstracts of the Electrochemical Society
Conference Dates
October 9-14, 1994
Conference Location
Miami Beach, FL, USA
Pub Type
Conferences
Citation
Created December 30, 1994, Updated October 12, 2021