Skip to main content
U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

Development of a Standard Reference Material for Measurement of Interstitial Oxygen Concentration in Semiconductor Silicon by Infrared Absorption

Published

Author(s)

Brian G. Rennex, James R. Ehrstein, Robert I. Scace
Proceedings Title
Extended Abstracts of the Electrochemical Society
Conference Dates
October 9-14, 1994
Conference Location
Miami Beach, FL, USA

Citation

Rennex, B. , Ehrstein, J. and Scace, R. (1994), Development of a Standard Reference Material for Measurement of Interstitial Oxygen Concentration in Semiconductor Silicon by Infrared Absorption, Extended Abstracts of the Electrochemical Society, Miami Beach, FL, USA (Accessed April 14, 2024)
Created December 30, 1994, Updated October 12, 2021