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Development of hydrogen and hydroxyl contamination in thin silicon dioxide thermal films:

Published

Author(s)

Santos Mayo, William H Evans
Citation
- NBS IR 78-1558
Report Number
NBS IR 78-1558

Citation

Mayo, S. and Evans, W. (1979), Development of hydrogen and hydroxyl contamination in thin silicon dioxide thermal films:, , National Institute of Standards and Technology, Gaithersburg, MD, [online], https://doi.org/10.6028/NBS.IR.78-1558 (Accessed February 24, 2024)
Created January 1, 1979, Updated May 19, 2023