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PUBLICATIONS

Computational Process Control Compatible Dimensional Metrology Tool: Through-focus Scanning Optical Microscopy

Published

Author(s)

Ravikiran Attota
Proceedings Title
2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
Conference Dates
August 24-26, 2020
Conference Location
Saratoga Springs, NY
Pub Type
Conferences

Download Paper

https://doi.org/10.1109/ASMC49169.2020.9185358
Local Download
Nanotechnology and Nanometrology

Citation

Attota, R. (2020), Computational Process Control Compatible Dimensional Metrology Tool: Through-focus Scanning Optical Microscopy, 2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC), Saratoga Springs, NY, [online], https://doi.org/10.1109/ASMC49169.2020.9185358 (Accessed October 21, 2025)

Issues

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Created September 2, 2020, Updated September 16, 2020
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