A Combinatorial Study of Thin Film Process Variables Using Microhotplates

Published

February 17, 2010

Author(s)

David L. Lahr, Joshua L. Hertz, Stephen Semancik

Abstract

A major goal of materials research over the past two decades has been the development of high throughput methods for rapid discovery and optimization of processing routes. These methods rely on highly parallel materials synthesis to efficiently create libraries wherein at least one processing parameter has been systematically varied. Here, we demonstrate a method of using an array of MEMS-based microhotplates in the high throughput optimization of a chemical vapor deposition process. Electrical and thermal processing variables are independently controlled at each element of the array, both during and after deposition. In the experiment described, SnO2 films were deposited on the microhotplates at 375 °C or 500 °C, with pulsed or continuous heating, and with voltage applied or not applied to the films. A 16-element microhotplate array was used, thus allowing a repeated, full factorial exploration of the experimental space. After deposition, sputter depth profile via X-Ray Photoelectron Spectroscopy (XPS) was used to determine the thickness (and thereby deposition rate) of the films. Statistical modeling then determined the 1st and higher order effects of the growth conditions. Though applied here to the growth rate during chemical vapor deposition, the technology described is generally applicable for high-throughput study of the effects of thermal and electrical processing steps in thin film manufacture.

Citation

IEEE Journal of Microelectromechanical Systems (Journal of MEMs)

Pub Type

Journals

Download Paper

https://doi.org/10.1109/JMEMS.2010.2040242

Local Download

Keywords

array, factorial exploration, microhotplates, thermal processing, thin films, x-ray photoelectron spectroscopy

Citation

Lahr, D. , Hertz, J. and Semancik, S. (2010), A Combinatorial Study of Thin Film Process Variables Using Microhotplates, IEEE Journal of Microelectromechanical Systems (Journal of MEMs), [online], https://doi.org/10.1109/JMEMS.2010.2040242, https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=901990 (Accessed September 11, 2025)