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Characterization of Two-Dimensional Dopant Profiles: Status and Review

Published

Author(s)

Alain C. Diebold, M. Kump, Joseph Kopanski, David G. Seiler
Proceedings Title
Proc., International Workshop on the Measurement and Characterization of Ultrashallow Doping Profiles in Semiconductors
Conference Dates
March 20-22, 1995
Conference Location
Research Triangle Park, NC, USA

Citation

Diebold, A. , Kump, M. , Kopanski, J. and Seiler, D. (1995), Characterization of Two-Dimensional Dopant Profiles: Status and Review, Proc., International Workshop on the Measurement and Characterization of Ultrashallow Doping Profiles in Semiconductors, Research Triangle Park, NC, USA (Accessed April 16, 2024)
Created December 30, 1995, Updated October 12, 2021