Vogel, E.
(2005),
Characterization of Electrically Active Defects in High-k Gate Dielectrics Using Charge Pumping, Proceedings of the NATO Advanced Research Workshop on Defects in Advanced High-k Dielectrics, St. Petersburg, RS
(Accessed April 16, 2024)
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.
Characterization of Electrically Active Defects in High-k Gate Dielectrics Using Charge Pumping
Published
Author(s)
Proceedings Title
Proceedings of the NATO Advanced Research Workshop on Defects in Advanced High-k Dielectrics
Conference Dates
July 11-14, 2005
Conference Location
St. Petersburg, RS
Conference Title
NATO Advanced Research Workshop on Defects in Advanced High-k Dielectrics
Pub Type
Conferences
Citation
Created July 14, 2005, Updated January 27, 2020