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PUBLICATIONS

Characterization and Production Metrology of Gate Dielectric Films: Optical Models for Oxynitrides and High Dielectric Constant Films

Published

Author(s)

Alain C. Diebold, J Canterbury, W Chism, Curt A. Richter, Nhan Van Nguyen, James R. Ehrstein, C E. Weintraub
Citation
Materials Science in Semiconductor Processing
Volume
4
Pub Type
Journals

Citation

Diebold, A. , Canterbury, J. , Chism, W. , Richter, C. , Nguyen, N. , Ehrstein, J. and Weintraub, C. (2001), Characterization and Production Metrology of Gate Dielectric Films: Optical Models for Oxynitrides and High Dielectric Constant Films, Materials Science in Semiconductor Processing (Accessed October 9, 2025)

Issues

If you have any questions about this publication or are having problems accessing it, please contact [email protected].

Created February 5, 2001, Updated October 12, 2021
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