Diebold, A.
, Canterbury, J.
, Chism, W.
, Richter, C.
, Nguyen, N.
, Ehrstein, J.
and Weintraub, C.
(2001),
Characterization and Production Metrology of Gate Dielectric Films: Optical Models for Oxynitrides and High Dielectric Constant Films, Materials Science in Semiconductor Processing
(Accessed October 4, 2024)
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Characterization and Production Metrology of Gate Dielectric Films: Optical Models for Oxynitrides and High Dielectric Constant Films
Published
Author(s)
Alain C. Diebold, J Canterbury, W Chism, , , , C E. Weintraub
Citation
Materials Science in Semiconductor Processing
Volume
4
Pub Type
Journals
Citation
Issues
If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.
Created February 5, 2001, Updated October 12, 2021