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Characterization and Production Metrology of Gate Dielectric Films: Optical Models for Oxynitrides and High Dielectric Constant Films

Published

Author(s)

Alain C. Diebold, J Canterbury, W Chism, Curt A. Richter, Nhan Van Nguyen, James R. Ehrstein, C E. Weintraub
Citation
Materials Science in Semiconductor Processing
Volume
4

Citation

Diebold, A. , Canterbury, J. , Chism, W. , Richter, C. , Nguyen, N. , Ehrstein, J. and Weintraub, C. (2001), Characterization and Production Metrology of Gate Dielectric Films: Optical Models for Oxynitrides and High Dielectric Constant Films, Materials Science in Semiconductor Processing (Accessed June 21, 2024)

Issues

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Created February 5, 2001, Updated October 12, 2021