Challenges in Metrology for the Semiconductor Industry
Stephen Knight, Joaquin (. Martinez
Leading edge Ultra Large Scale Integrated Circuit manufacture is now well into the realm of Nanoelectronics, with some critical dimensions below 40 nm. The pressures on metrology supporting this manufacture are escalating rapidly. In this presentation we will discuss present and future metrology needs and potential solutions.
and Martinez, J.
Challenges in Metrology for the Semiconductor Industry, Journal of Vacuum Science and Technology B, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=31889
(Accessed June 3, 2023)