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Carbon nanotube applications to scanning probe microscopy for next generation semiconductor metrology

Published

Author(s)

Victor H. Vartanian, Paul McClure, Vladimir Mancevski, Joseph Kopanski, Phillip D. Rack, Ilona Sitnitsky, Matthew D. Bresin, Vincent LaBella, Kathleen Dunn

Abstract

This paper presents an evaluation of e-beam assisted deposition and welding of conductive carbon nanotube (c-CNT) tips for electrical scanning probe microscope measurements. Variations in CNT tip conductivity and contact resistance during fabrication were determined as a function of tip geometry using tunneling AFM (TUNA). Conductive CNT tips were used to measure 2D dopant concentration as a function of annealing conditions in BF2-implanted samples.

Citation

Vartanian, V. , McClure, P. , Mancevski, V. , Kopanski, J. , Rack, P. , Sitnitsky, I. , Bresin, M. , LaBella, V. and Dunn, K. (2010), Carbon nanotube applications to scanning probe microscopy for next generation semiconductor metrology (Accessed April 20, 2024)
Created August 2, 2010, Updated October 12, 2021