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Boron Incorporation With and Without Atomic Hydrogen During the Growth of Doped Layers on Si(100)

Published

Author(s)

C Silvestre, P Thompson, G Jernigan, David S. Simons
Citation
Journal of Vacuum Science and Technology A
Volume
16
Issue
4

Citation

Silvestre, C. , Thompson, P. , Jernigan, G. and Simons, D. (1998), Boron Incorporation With and Without Atomic Hydrogen During the Growth of Doped Layers on Si(100), Journal of Vacuum Science and Technology A (Accessed July 22, 2024)

Issues

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Created June 30, 1998, Updated October 12, 2021