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PUBLICATIONS

Boron Incorporation With and Without Atomic Hydrogen During the Growth of Doped Layers on Si(100)

Published

Author(s)

C Silvestre, P Thompson, G Jernigan, David S. Simons
Citation
Journal of Vacuum Science and Technology A
Volume
16
Issue
4
Pub Type
Journals
Chemistry

Citation

Silvestre, C. , Thompson, P. , Jernigan, G. and Simons, D. (1998), Boron Incorporation With and Without Atomic Hydrogen During the Growth of Doped Layers on Si(100), Journal of Vacuum Science and Technology A (Accessed October 11, 2025)

Issues

If you have any questions about this publication or are having problems accessing it, please contact [email protected].

Created June 30, 1998, Updated October 12, 2021
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