Rawie, C.
(1982),
Benefits and costs of improved measurements ::the case of integrated-circuit photomask linewidths, , National Institute of Standards and Technology, Gaithersburg, MD, [online], https://doi.org/10.6028/NBS.IR.82-2458
(Accessed March 24, 2025)
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Benefits and costs of improved measurements ::the case of integrated-circuit photomask linewidths
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- NBS IR 82-2458
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NBS IR 82-2458
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NIST Pubs
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Created January 1, 1982, Updated May 19, 2023