@misc{1180046,
  author = {Carol Chapman Rawie},
  title = {Benefits and costs of improved measurements ::the case of integrated-circuit photomask linewidths},
  year = {1982},
  month = {1982-01-01 05:01:00},
  publisher = {, National Institute of Standards and Technology, Gaithersburg, MD},
  doi = {https://doi.org/10.6028/NBS.IR.82-2458},
  language = {en},
}