TY  - GEN
AU  - Carol Chapman Rawie
C2  - , National Institute of Standards and Technology, Gaithersburg, MD
DA  - 1982-01-01 05:01:00
DO  - https://doi.org/10.6028/NBS.IR.82-2458
LA  - en
PB  - , National Institute of Standards and Technology, Gaithersburg, MD
PY  - 1982
TI  - Benefits and costs of improved measurements ::the case of integrated-circuit photomask linewidths
ER  -