Gladden, W.
, Slaughter, S.
, Duncan, W.
and Baghdadi, A.
(1988),
Automatic determination of the interstitial oxygen content of silicon wafers polished on both sides:, , National Institute of Standards and Technology, Gaithersburg, MD, [online], https://doi.org/10.6028/NIST.SP.400-81
(Accessed December 7, 2024)
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Automatic determination of the interstitial oxygen content of silicon wafers polished on both sides:
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- NIST SP 400-81
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NIST SP 400-81
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NIST Pubs
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Created January 1, 1988, Updated May 20, 2023