Potzick, J.
(1989),
Automated Calibration of Optical Photomask Linewidth Standards at the National Institute of Standards and Technology, Proc. Intl. Soc. for Optical Engineering (SPIE), Integrated Circuit Metrology, Inspection, and Process Control III, Los Angeles, CA
(Accessed April 19, 2024)
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Automated Calibration of Optical Photomask Linewidth Standards at the National Institute of Standards and Technology
Published
Author(s)
Proceedings Title
Proc. Intl. Soc. for Optical Engineering (SPIE), Integrated Circuit Metrology, Inspection, and Process Control III
Volume
1087
Conference Dates
February 27-28, 1989
Conference Location
Los Angeles, CA
Pub Type
Conferences
Citation
Created December 31, 1989, Updated February 17, 2017