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Automated Calibration of Optical Photomask Linewidth Standards at the National Institute of Standards and Technology

Published

Author(s)

James E. Potzick
Proceedings Title
Proc. Intl. Soc. for Optical Engineering (SPIE), Integrated Circuit Metrology, Inspection, and Process Control III
Volume
1087
Conference Dates
February 27-28, 1989
Conference Location
Los Angeles, CA

Citation

Potzick, J. (1989), Automated Calibration of Optical Photomask Linewidth Standards at the National Institute of Standards and Technology, Proc. Intl. Soc. for Optical Engineering (SPIE), Integrated Circuit Metrology, Inspection, and Process Control III, Los Angeles, CA (Accessed May 19, 2024)

Issues

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Created December 31, 1989, Updated February 17, 2017