Chandler-Horowitz, D.
, Nguyen, N.
and Ehrstein, J.
(2003),
Assessment of Utlra-thin SiO2 Film Thickness Meaurement Precision by Ellipsometry, Characterization and Metrology for ULSI Technology: 2003, Austin, TX, USA
(Accessed April 25, 2024)
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Assessment of Utlra-thin SiO2 Film Thickness Meaurement Precision by Ellipsometry
Published
Author(s)
, ,
Proceedings Title
Characterization and Metrology for ULSI Technology: 2003
Conference Location
Austin, TX, USA
Conference Title
2003 International Conference on Characterization and Metrology for ULSI Technology
Pub Type
Conferences
Citation
Created September 29, 2003, Updated October 12, 2021