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Assessment of Utlra-thin SiO2 Film Thickness Meaurement Precision by Ellipsometry

Published

Author(s)

Deane Chandler-Horowitz, Nhan Van Nguyen, James R. Ehrstein
Proceedings Title
Characterization and Metrology for ULSI Technology: 2003
Conference Location
Austin, TX, USA
Conference Title
2003 International Conference on Characterization and Metrology for ULSI Technology

Citation

Chandler-Horowitz, D. , Nguyen, N. and Ehrstein, J. (2003), Assessment of Utlra-thin SiO2 Film Thickness Meaurement Precision by Ellipsometry, Characterization and Metrology for ULSI Technology: 2003, Austin, TX, USA (Accessed April 21, 2024)
Created September 29, 2003, Updated October 12, 2021