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An approach to accurate x-ray mask measurements in a scanning electron microscope:

Published

Author(s)

Michael T Postek, Robert D Larrabee, William J Keery
Citation
- NIST IR 89-4047
Report Number
NIST IR 89-4047

Citation

Postek, M. , Larrabee, R. and Keery, W. (1989), An approach to accurate x-ray mask measurements in a scanning electron microscope:, , National Institute of Standards and Technology, Gaithersburg, MD, [online], https://doi.org/10.6028/NIST.IR.89-4047 (Accessed November 10, 2024)

Issues

If you have any questions about this publication or are having problems accessing it, please contact reflib@nist.gov.

Created January 1, 1989, Updated May 20, 2023