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Application of the Modified Voltage-Dividing Potentiometer to Overlay Metrology in a CMOS/Bulk Process

Published

Author(s)

Richard A. Allen, Michael W. Cresswell, Loren W. Linholm, Jinsheng Wen, Colleen E. Hood, T. A. Hill, J. D. Benecke, S. R. Volk, H. D. Stewart
Proceedings Title
Proc., IEEE International Conference on Microelectronic Test Structures
Volume
7
Issue
158
Conference Dates
March 22-24, 1994
Conference Location
San Diego, CA, USA

Citation

Allen, R. , Cresswell, M. , Linholm, L. , Wen, J. , Hood, C. , Hill, T. , Benecke, J. , Volk, S. and Stewart, H. (1994), Application of the Modified Voltage-Dividing Potentiometer to Overlay Metrology in a CMOS/Bulk Process, Proc., IEEE International Conference on Microelectronic Test Structures, San Diego, CA, USA (Accessed November 8, 2024)

Issues

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Created December 30, 1994, Updated October 12, 2021