This paper introduces recent advances in scatterfield microscopy using improved normalization and fitting procedures. Reduced measurement uncertainties are obtained through the use of more accurate normalization procedures in combination with better parametric fitting algorithms. A new approach to embed atomic force microscopy (AFM) or other reference metrology measurements directly in the uncertainty analysis and library-fitting process is used to reduce parametric uncertainties. We present both simulation results and experimental data demonstrating this new method, which is based on Bayesian analysis as applied to library-based regression.
Proceedings Title: SPIE Proc. Optical Metrology
Conference Dates: June 22-25, 2009
Conference Location: Munich, -1
Pub Type: Conferences
scatterfield microscopy, Köhler illuminated, bright field microscope, Angle and polarization resolved illumination, reference metrology, angle-resolved scatterfield