Sohn, M.
and Silver, R.
(2014),
193 nm scatterfield microscope illumination optics, International Optical Design Conference 2014, Kohala Coast, HI, [online], https://doi.org/10.1117/12.2074211
(Accessed December 11, 2024)
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193 nm scatterfield microscope illumination optics
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Abstract
A scatterfield microscope for deep sub-wavelength semiconductor metrology using 193 nm light has been designed. In addition to accommodating the fixed numerical aperture and size of its commercial catadioptric objective lens, the illumination optics are formed to implement essential parameters necessary for angular illumination control at the sample plane. This angle-resolved scatterfield microscope requires access to a relatively large (> 10 mm) conjugate back focal plane as well as increased fluence from the ArF excimer laser source. The parametric optimization process yielded a telecentric conjugate back focal plane with appropriate numerical aperture and diameter by adjustment of the parameters of two interrelated lens groups.Proceedings Title
International Optical Design Conference 2014
Volume
9293
Conference Dates
June 22-26, 2014
Conference Location
Kohala Coast, HI
Pub Type
Conferences
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Keywords
Scatterfield microscopy, 193 nm, lens design, microscope design, instrumentation, measurement, semiconductor metrology, angular illumination
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Created December 17, 2014, Updated November 10, 2018