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Ronald L. Jones (Fed)

Leader, Neutron Condensed Matter Science Group

A group of approximately 70 members, the Neutron Condensed Matter Science Group works to develop and operate neutron-based measurements within the NIST Center for Neutron Research (NCNR). These niche but cutting-edge instruments measure details of materials structure not visible through other methods, and are designed specifically to meet current and emerging needs of the nation's scientists and engineers. Making these powerful instruments accessible broadly, our scientists work with academia, industry, and other government agencies to advance manufacturing and technology development. Currently, the group operates and makes available for use 13 neutron scattering and spectroscopy instruments that can measure structure from the atomic to the macroscopic scales, and dynamic phenomena across five orders of magnitude in frequency and energy.  NCMS researchers serve as the primary contact point for facility users, visiting researchers, and collaborative programs at the NCNR. The group also supports industrial consortia, including the NIST nMat consortium, and industry partnerships including full cost recovery access. We support a wide range of critical technology topics including residual stress mapping in complex mechanical parts, catalysis and chemical separations, biopharmaceuticals, magnetic structure, film structure and uniformity, colloidal fluid rheology, food processing, and battery technology. The group also participates in activities funded through cooperative agreements to develop new instrument concepts, support existing instrument operations, and bring niche expertise required for cutting edge technologies such as autonomous experimentation and quantum materials.

Awards

  • George Uriano Award for Intramural Programs (2016)
  • International Center for Young Scientists Fellowship (2007)
  • Department of Commerce Silver Medal for Outstanding Research (2006)
  • National Research Council Fellowship (2002-2004)
  • American Physical Society Padden Award Finalist (2000)
  • Argonne National Laboratory Summer Research Fellowship (1996)

News

Publications

Chemically Amplified Photoresists Fundamental Properties and Limits of Applicability to Sub-100 nm Lithography

Author(s)
D M. Goldfarb, Eric K. Lin, Christopher Soles, B C. Trinque, S D. Burns, Ronald L. Jones, Joseph~undefined~undefined~undefined~undefined~undefined Lenhart, M Angelopoulos, C G. Wilson, Sushil K. Satija, Wen-Li Wu
State-of-the-art lithographic technologies combine chemically amplified photoresists and sophisticated radiation sources to delineate patterned areas with high...
Created October 9, 2019, Updated March 16, 2026
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