Skip to main content
U.S. flag

An official website of the United States government

Dot gov

Official websites use .gov
A .gov website belongs to an official government organization in the United States.


Secure .gov websites use HTTPS
A lock ( ) or https:// means you've safely connected to the .gov website. Share sensitive information only on official, secure websites.

John H. Burnett

John Burnett is a staff physicist in the Physical Measurement Laboratory at NIST. His principal area of research is experimental studies on the optical properties of solids and liquids, from the visible through the vacuum ultraviolet. A particular focus is on optical materials important for semiconductor lithography. He has also recently been pursuing projects involving UV interferometry for lithography applications, and UV nonlinear optics.

He is a member of the American Physical Society, the Optical Society of America, SPIE, and the Phi Beta Kappa Society.

His awards include: U.S. Department of Commerce 2000 Silver Medal Award for Scientific Achievement, 2002 Arthur S. Flemming Scientific Award, U.S. Department of Commerce 2002 Silver Medal Award for Scientific Achievement, NIST 2006 William P. Slichter Award. He has been awarded 1 patent.

Research Projects:

  • Index and birefringence properties of optical materials (5 μm - 0.12 μm) and their dependencies on temperature and pressure
  • UV Interferometry
  • Spectroscopy of solids
  • Nonlinear optical properties of materials


Index of refraction of germanium

John H. Burnett, Eric C. Benck, Simon G. Kaplan, Erik Stover, Adam Phenis
Measurements of the index of refraction of a sample of high-quality, single-crystal germanium using the minimum deviation refractometry method are presented for

Refractive index measurements of Ge

John H. Burnett, Simon G. Kaplan
A program has been started at NIST to make high-accuracy measurements of the infrared (IR) index properties of technologically important IR materials, in order

Binary amplitude holograms made from dyed photoresist

Quandou (. Wang, Ulf Griesmann, John H. Burnett
A method for fabricating binary amplitude holograms from a dyed photoresist is described. It is of particular interest for holograms that are used as null

Nanoelectronics Lithography

Stephen Knight, Vivek M. Prabhu, John H. Burnett, James A. Liddle, Christopher L. Soles, Alain C. Diebold
This is a compiled chapter that will be included into the Handbook of Nanophysics.
Created October 9, 2019