Dr. Stafford is a member of the Functional Nanostructured Materials Group in the Materials Science and Engineering Division at the National Institute of Standards and Technology (NIST). He earned his B.S. in chemical engineering from the University of Notre Dame and his PhD in materials science from the University of Virginia. From 1980 to 1986 he was a senior research engineer with Celanese Research Co., Summit, NJ, where he worked on electrogenerative processes and the development of polymeric separator materials for batteries and fuel cells. He joined NIST in 1986 and served as the Leader of the Electrochemical Processing Group from 1994 to 2005. Dr. Stafford's research interests focus on the application of electrochemical and analytical methods to understand electrodeposition processes. Recently he has developed an in situ wafer curvature method for studying surface and growth stress with resolution sufficient to study the adsorption of molecular monolayers onto the electrode surface. These measurements are particularly well-suited for studying underpotential metal deposition, self-assembled monolayers, and competitive adsorption processes. Dr. Stafford has authored over 100 technical papers and a book chapter on the electrodeposition of aluminum alloys from chloroaluminate ionic liquids. He is a member of the American Chemical Society, the International Society of Electrochemistry, and a Fellow of the Electrochemical Society.
Research interests include:
Awards and Honors (NIST):