Tarrio, C.
, Berg, R.
, Lucatorto, T.
, Lairson, B.
, Lopez, H.
and Ayers, T.
(2015),
Thermally stable thin-film filters for high-power extreme-ultraviolet applications, Review of Scientific Instruments, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=919314
(Accessed October 9, 2025)
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Thermally stable thin-film filters for high-power extreme-ultraviolet applications
Published
Author(s)
, , , Bruce Lairson, Heidi Lopez, Travis Ayers
Abstract
We investigated several types of thin-film filters for high intensity work in the extreme-ultraviolet (EUV) spectral range. In our application, with a peak EUV intensity of 2.7 W cm-2, Ni-mesh-backed Zr filters have a typical lifetime of 20 hours, at which point they suffer from pinholes and a 50 % loss of transmission. Initial trials with Si filters on Ni meshes resulted in rupture of the filters in less than an hour. A simple thermal calculation showed that the temperature rise in those filters was 580 K. A similar calculation indicated that using a finer mesh with thicker wires and made of Cu reduces the temperature increase to about 40 K. We have exposed a Si filter backed by such a mesh for more than 60 hours with little loss of transmission and no leaks.Citation
Review of Scientific Instruments
Volume
86
Pub Type
Journals
Download Paper
Keywords
extreme-ultraviolet, filters, thin films
Citation
Issues
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Created November 12, 2015, Updated February 19, 2017