Skip to main content

NOTICE: Due to a lapse in annual appropriations, most of this website is not being updated. Learn more.

Form submissions will still be accepted but will not receive responses at this time. Sections of this site for programs using non-appropriated funds (such as NVLAP) or those that are excepted from the shutdown (such as CHIPS and NVD) will continue to be updated.

U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

Modeling and Analysis of Scatterometry Signatures for Optical Critical Dimension Reference Material Applications

Published

Author(s)

Heather Patrick, Thomas Germer, Michael W. Cresswell, Richard A. Allen, Ronald G. Dixson, Michael Bishop
Proceedings Title
Frontiers of Characterization and Metrology for Nanoelectronics: 2007
Conference Dates
March 27-29, 2007
Conference Location
Gaithersburg, MD, USA
Conference Title
2007 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics

Citation

Patrick, H. , Germer, T. , Cresswell, M. , Allen, R. , Dixson, R. and Bishop, M. (2007), Modeling and Analysis of Scatterometry Signatures for Optical Critical Dimension Reference Material Applications, Frontiers of Characterization and Metrology for Nanoelectronics: 2007, Gaithersburg, MD, USA, [online], https://tsapps.nist.gov/publication/get_pdf.cfm?pub_id=32756 (Accessed October 22, 2025)

Issues

If you have any questions about this publication or are having problems accessing it, please contact [email protected].

Created September 29, 2007, Updated October 12, 2021
Was this page helpful?