Guillaume, N.
, Allen, R.
, Cresswell, M.
, Lahti, M.
, Linholm, L.
and Zaghloul, M.
(2004),
Non-contact Electrical CD Metrology Sensor for Chrome Photomasks Featuring a Low Temperature Co-fired Ceramic Technology, IEEE Transactions on Semiconductor Manufacturing
(Accessed October 18, 2025)
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Non-contact Electrical CD Metrology Sensor for Chrome Photomasks Featuring a Low Temperature Co-fired Ceramic Technology
Published
Author(s)
, , , Markku Lahti, ,
Abstract
The paper describes a non-contact capacitive-sensor metrology sensor developed to measure minimum feature sizes, also called critical dimensions (CDs), patterned on photomasks that are used in semiconductor device manufacture. Additionally, this paper describes the test structures printed on photomasks that facilitate linewidth metrology with the new sensor. The metrology sensor is fabricated using a Low Temperature Co-Fired Ceramic (LTCC) technology and its principle is based on non-contact micro-capacitance measurements of features on chrome-on-glass reticles.Citation
IEEE Transactions on Semiconductor Manufacturing
Volume
17
Issue
1
Pub Type
Journals
Keywords
critical dimensions (CDs), linewidth, low temperature co-fired ceramic technology (LTCC), non-contact capacitive sensor, photomask metrology
Citation
Issues
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Created April 30, 2004, Updated October 12, 2021