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PUBLICATIONS

Scanning Capacitance Microscopy Applied to 2D Dopant Profiling of Semiconductors

Published

Author(s)

Joseph Kopanski, Jay F. Marchiando, J R. Lowney
Proceedings Title
Proc., 3rd International Workshop on Expert Evaluation and Control of Compound Semiconductor Materials and Technologies
Conference Dates
May 11-15, 1996
Conference Location
Freiburg, 1, GM
Pub Type
Conferences

Citation

Kopanski, J. , Marchiando, J. and Lowney, J. (1997), Scanning Capacitance Microscopy Applied to 2D Dopant Profiling of Semiconductors, Proc., 3rd International Workshop on Expert Evaluation and Control of Compound Semiconductor Materials and Technologies, Freiburg, 1, GM (Accessed October 1, 2025)

Issues

If you have any questions about this publication or are having problems accessing it, please contact [email protected].

Created December 30, 1997, Updated October 12, 2021
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