A 193 nm Laser Detector Nonlinearity Measurement System

Published

January 1, 2003

Author(s)

Darryl A. Keenan, Holger Laabs, Shao Yang, Marla L. Dowell

Abstract

To meet the semiconductor industry's demands for accurate measurements, we have developed a method to characterize the nonlinear response of 193 nm excimer laser detectors. This system is complimentary to our other excimer laser power and energy calibration services and provides a quantitative measurement of a detector's response over a large energy/power range. Detectors are typically used over a larger energy/power range than that covered by a single calibration point. Measurement uncertainty can be introduced if the nonlinear response is not quantified. Range discontinuity, e.g., due to change in detector amplification, can also introduce additional measurement uncertainty. Experimental results revealed nonlinearity of some UV detectors as high as 8%.

Proceedings Title

Proc., Measurement Science Conference

Conference Dates

January 13-17, 2003

Conference Location

Anaheim, CA, USA

Pub Type

Conferences

Keywords

193 nm, nonlinearity

Citation

Keenan, D. , Laabs, H. , Yang, S. and Dowell, M. (2003), A 193 nm Laser Detector Nonlinearity Measurement System, Proc., Measurement Science Conference, Anaheim, CA, USA (Accessed July 4, 2025)