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PUBLICATIONS

Spectroscopic Ellipsometry Characterization of High-K Dielectric HfO2 Thin Films and the High-Temperature Annealing on Their Optical Properties

Published

Author(s)

Yong J. Cho, Nhan Van Nguyen, Curt A. Richter, James R. Ehrstein, Byoung H. Lee, Jack C. Lee
Citation
Applied Physics Letters
Volume
80
Issue
7
Pub Type
Journals

Keywords

high-k, spectroscopic ellipsometry, thin films

Citation

Cho, Y. , Nguyen, N. , Richter, C. , Ehrstein, J. , Lee, B. and Lee, J. (2002), Spectroscopic Ellipsometry Characterization of High-K Dielectric HfO<sub>2</sub> Thin Films and the High-Temperature Annealing on Their Optical Properties, Applied Physics Letters (Accessed October 12, 2025)

Issues

If you have any questions about this publication or are having problems accessing it, please contact [email protected].

Created February 17, 2002, Updated October 12, 2021
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