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PUBLICATIONS

Recent Developments in Electrical Linewidth and Overlay Metrology for Integrated Circuit Fabrication Processes

Published

Author(s)

Michael W. Cresswell, J. J. Sniegowski, Rathindra Ghoshtagore, Richard A. Allen, William F. Guthrie, A. W. Gurnell, Loren W. Linholm, E C. Teague
Citation
Japanese Journal of Applied Physics
Volume
35
Pub Type
Journals

Citation

Cresswell, M. , Sniegowski, J. , Ghoshtagore, R. , Allen, R. , Guthrie, W. , Gurnell, A. , Linholm, L. and Teague, E. (1996), Recent Developments in Electrical Linewidth and Overlay Metrology for Integrated Circuit Fabrication Processes, Japanese Journal of Applied Physics (Accessed October 20, 2025)

Issues

If you have any questions about this publication or are having problems accessing it, please contact [email protected].

Created December 30, 1996, Updated October 12, 2021
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