A New Approach to Accurate X-Ray Mask Measurements in a Scanning Electron Microscope

Michael T. Postek; Robert D. Larrabee; William J. Keery

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PUBLICATIONS

A New Approach to Accurate X-Ray Mask Measurements in a Scanning Electron Microscope

Published

November 1, 1989

Author(s)

Michael T. Postek, Robert D. Larrabee, William J. Keery

Citation

IEEE Transactions on Electron Devices

Volume

Issue

Pub Type

Journals

Citation

Postek, M. , Larrabee, R. and Keery, W. (1989), A New Approach to Accurate X-Ray Mask Measurements in a Scanning Electron Microscope, IEEE Transactions on Electron Devices (Accessed May 1, 2026)

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Issues

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Created October 31, 1989, Updated October 12, 2021

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