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PUBLICATIONS

Electric Field Dependent Dielectric Breakdown of Intrinsic SiO2 Films Under Dynamic Stress

Published

Author(s)

P Chaparala, John S. Suehle, C. Messick, M. Roush
Proceedings Title
Proc., 34th Annual IEEE International Reliability Physics Symposium
Conference Dates
April 30-May 2, 1996
Conference Location
Dallas, TX, USA
Pub Type
Conferences

Citation

Chaparala, P. , Suehle, J. , Messick, C. and Roush, M. (1996), Electric Field Dependent Dielectric Breakdown of Intrinsic SiO<sub>2</sub> Films Under Dynamic Stress, Proc., 34th Annual IEEE International Reliability Physics Symposium, Dallas, TX, USA (Accessed October 17, 2025)

Issues

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Created December 30, 1996, Updated October 12, 2021
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