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PUBLICATIONS

Selected Area channeling Pattern and Defect Etch Study of Silicon Implanted with Oxygen, MIcrobeam Analysis - 1988

Published

Author(s)

Peter Roitman, G. E. Davis
Proceedings Title
Proc., 22nd Annual Conference, Materials Analysis Society
Conference Dates
August 8-12, 1988
Conference Location
Milwaukee, WI, USA
Pub Type
Conferences

Citation

Roitman, P. and Davis, G. (1988), Selected Area channeling Pattern and Defect Etch Study of Silicon Implanted with Oxygen, MIcrobeam Analysis - 1988, Proc., 22nd Annual Conference, Materials Analysis Society, Milwaukee, WI, USA (Accessed November 5, 2025)

Issues

If you have any questions about this publication or are having problems accessing it, please contact [email protected].

Created December 30, 1988, Updated October 12, 2021
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