In this paper, we describe our design and the manufacturing of a two-dimensional grid artifact of chrome on quartz on a 6 inch by 6 inch by .250 glass blank. The design has been agreed upon by a number of SEMI participants working on a two-dimensional grids calibration task force within the Microlithography Committee. We present the measurement procedures and describe the algorithms used in the measurement process. We present a prototype artifact which is expected to be developed into a NIST-distributed standard reference material once the final design has been agreed upon. We present measurements made at leading industrial sites and develop a traceability chain based on these measurements, in combination with NIST-based measurements. The artifact has been measured on the NIST linescale interferometer, as well as other NIST metrology tools. We present the status of the comparisons between these measurements and those performed by the industrial collaborators.
Proceedings Title: Proceedings of SPIE, Metrology, Inspection, and Process Control for Microlithography XIII, Bhanwar Singh, Editor
Conference Dates: March 15, 1999
Conference Location: Santa Clara, CA
Conference Title: Registration and Overlay I
Pub Type: Conferences
grid artifact, linescale interferometer, measurement methodology, two-dimensional calibration