SEM Sentinel-SEM Performance Measurement System

Published

August 1, 2001

Author(s)

Bradley N. Damazo, Andras Vladar, Alice V. Ling, Alkan Donmez, Michael T. Postek, Crossley E. Jayewardene

Abstract

This paper describes the design and implementation of a system for monitoring the performance of a critical dimension measurement scanning electron microscope (CD-SEM). Experiments were performed for tests involving diagnosis of the vacuum system and column stability by monitoring of the following subsystems and associated functional parameters. These include: 1) Vacuum system with pressure as a function of time being recorded for the electron-optical column (gun chamber), the specimen chamber, and the sample-loading unit. 2) The action of several components of the wafer handling system can be timed. 3) The electron gun emission currents and other signals to monitor the characteristics of the condenser and objective lenses may be used to correlate with image quality. 4) Image sharpness, electron beam current, signal-to-noise ratio, etc. can be evaluated.

Proceedings Title

Proceedings of SPIE, Metrology, Inspection, and Process Control for Microlithography XV, Neal T. Sullivan, Editor

Volume

4344

Conference Dates

February 26-March 2, 2001

Conference Location

Santa Clara, CA, USA

Conference Title

Poster Session

Pub Type

Conferences

Keywords

auromatic, computer control, monitoring, performance, SEM

Citation

Damazo, B. , Vladar, A. , Ling, A. , Donmez, A. , Postek, M. and Jayewardene, C. (2001), SEM Sentinel-SEM Performance Measurement System, Proceedings of SPIE, Metrology, Inspection, and Process Control for Microlithography XV, Neal T. Sullivan, Editor, Santa Clara, CA, USA (Accessed October 11, 2025)