Dimensional Metrology at the Nanometer Level: Combined SEM and PPM

Published

July 1, 1997

Author(s)

Michael T. Postek, H Ho, L Harrison

Abstract

The National Institute of Standards and Technology (NIST) is currently exploring the potentials afforded by the incorporation of a commercial proximal probe microscope (PPM) operating in the scanning tunneling or atomic force mode into a high resolution field emission scanning electron microscope (SEM). This instrument will be used in the development of NIST traceable standards for dimensional metrology at the nanometer level. The combination of the two microscopic techniques provides: high precision probe placement, the capability of measuring and monitoring the probe geometry. monitoring the scanning of the probe across the feature of interest and an ability for comparative microscopy. The integration of the commercial instrument is the first step in the development of a custom NIST integrated SEM/SxM metrology instrument (with the x variable depending upon the type of probe being used). This paper presents early results regarding the integration of the two instruments and the application of these instruments to the development of SRM 2090 and the SEM sharpness standard.

Proceedings Title

Proceedings of SPIE, Metrology, Inspection, and Process Control for Microlithography XI, Susan K. Jones, Editor

Volume

3050

Conference Dates

March 10, 1997

Conference Location

Santa Clara, CA, USA

Conference Title

Scanning Probe Metrology II

Pub Type

Conferences

Keywords

atomic force microscope, metrology, proximal probe microscopy, resolution, scanning electron microscope, Standard Reference Materials, standards

Citation

Postek, M. , Ho, H. and Harrison, L. (1997), Dimensional Metrology at the Nanometer Level: Combined SEM and PPM, Proceedings of SPIE, Metrology, Inspection, and Process Control for Microlithography XI, Susan K. Jones, Editor, Santa Clara, CA, USA (Accessed October 14, 2025)