TY  - CONF
AU  - Michael Postek
AU  - H Ho
AU  - L Harrison
C2  - Proceedings of SPIE, Metrology, Inspection, and Process Control for Microlithography XI, Susan K. Jones, Editor, Santa Clara, CA, USA
DA  - 1997-07-01 00:07:00
LA  - en
M1  - 3050
PB  - Proceedings of SPIE, Metrology, Inspection, and Process Control for Microlithography XI, Susan K. Jones, Editor, Santa Clara, CA, USA
PY  - 1997
TI  - Dimensional Metrology at the Nanometer Level: Combined SEM and PPM
ER  -