NOTICE: Due to a lapse in annual appropriations, most of this website is not being updated. Learn more.

Form submissions will still be accepted but will not receive responses at this time. Sections of this site for programs using non-appropriated funds (such as NVLAP) or those that are excepted from the shutdown (such as CHIPS and NVD) will continue to be updated.

U.S. flag

An official website of the United States government

Official websites use .gov
A .gov website belongs to an official government organization in the United States.

Secure .gov websites use HTTPS
A lock ( ) or https:// means you’ve safely connected to the .gov website. Share sensitive information only on official, secure websites.

PUBLICATIONS

A Numerical/Experimental Investigation of Microcontamination in a Rotating Disk Chemical Vapor Deposition Reactor

Published

Author(s)

R W. Davis, Elizabeth F. Moore, James E. Maslar, Donald R. Burgess Jr., D M. Kremer, S H. Ehrman

Abstract

Driven by a relentless decrease in feature size, the allowable particle contaminant size during semiconductor fabrication is now less than 100 nm. Particles in this size range (microcontaminants) in chemical vapor deposition (CVD) reactors are primarly gas-phase generated and are very poorly understood. The purpose of the investigation described here is to enhance the understanding of the formation, transport and growth of microcontaminants in thermal CVD reactors. The approach being employed is to carry out a combined numerical/experimental study in which the particle dynamics are both modeled and optically probed in a rotating disk CVD reactor. The rotating disk configuration is utilized because of its simple and well-defined flow in which a particle layer forms in a highly accessible region of the reactor just above the substrate. Numerical/experimental comparisons of layer location and thickness as a function of disk rotation rate are shown to be excellent if two empirically determined parameters in the model are properly chosen.
Proceedings Title
Characterization and Metrology for ULSI Technology 2000, International Conference | | Characterization and Metrology for ULSI Technology |AIP
Volume
550
Conference Dates
June 26-29, 2000
Conference Title
AIP Conference Proceedings
Pub Type
Conferences

Keywords

aerosol modeling, chemical vapor depositon, numerical modeling, optical diagnostics

Citation

Davis, R. , Moore, E. , Maslar, J. , Burgess, D. , Kremer, D. and Ehrman, S. (2001), A Numerical/Experimental Investigation of Microcontamination in a Rotating Disk Chemical Vapor Deposition Reactor, Characterization and Metrology for ULSI Technology 2000, International Conference | | Characterization and Metrology for ULSI Technology |AIP (Accessed October 27, 2025)

Issues

If you have any questions about this publication or are having problems accessing it, please contact [email protected].

Created February 1, 2001, Updated February 17, 2017
Was this page helpful?