, K.
and Sobolewski, M.
(1998),
Spatial Uniformity in Chamber-Cleaning Plasmas Measured Using Planar Laser-Induced Fluorescence, Characterization and Metrology for ULSI Technology Conference
(Accessed May 9, 2025)
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Spatial Uniformity in Chamber-Cleaning Plasmas Measured Using Planar Laser-Induced Fluorescence
Published
Author(s)
,
Abstract
Planar laser-induced fluorescence (PLIF) measurements were made to determine 2-D spatial maps of CF2 density as an indicatior of chemical uniformity in 92% CF 4square root of O2 and 50% C2F6 square root of O2 chamber cleaning plasmas. Measurements were also made of broadband optical emission and of discharge current and voltage. All measurements were made in the Gaseous Electronics Conference (GEC)reference cell, a capacitively-coupled, parallel-plate platform designed to facilitate comparison of results among laboratories. The PLIF and emission results were found to correlate with discharge current and voltage measurements. Together, these optical and electrical measurements provide insight into the optimization of chamber-cleaning processes and areactors and suggest new methods of monitoring plasma uniformity.Conference Dates
January 1, 1998
Conference Title
Characterization and Metrology for ULSI Technology Conference
Pub Type
Conferences
Keywords
chamber-cleaning, Planar Laser-Induced Fluorescence (PLIF), plasma diagnostics, plasmas
Citation
Issues
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Created January 1, 1998, Updated February 17, 2017